This position is for a Research Assistant/Associate to work in Professor Judith Driscoll’s research group,, to undertake research on ferroelectric HfO2 thin films made by advanced, pulsed laser deposition. The position is funded by funded by Samsung Advanced Institute of Technology. The successful applicant will be expected to undertake experimental research in a team environment, working under the supervision of Professor Driscoll, alongside other research groups within the University of Cambridge collaborating on this topic. This includes: Di Martino’s group (, and Flewitt’s group (, where electrical characterization will be performed, and the Samsung research laboratory in Korea, where specialised devices will be synthesised and measured.


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